{"id":392,"date":"2022-12-16T04:54:18","date_gmt":"2022-12-16T04:54:18","guid":{"rendered":"https:\/\/semicon.hiroshima-u.ac.jp\/?p=392"},"modified":"2022-12-16T04:54:20","modified_gmt":"2022-12-16T04:54:20","slug":"international-symposium-on-semiconductor-manufacturing-2022%ef%bc%88issm2022%ef%bc%89%e3%81%ab%e5%8f%82%e5%8a%a0%e3%80%81%e7%99%ba%e8%a1%a8%e3%82%92%e8%a1%8c%e3%81%84%e3%81%be%e3%81%97%e3%81%9f","status":"publish","type":"post","link":"https:\/\/semicon.hiroshima-u.ac.jp\/?p=392","title":{"rendered":"International Symposium on Semiconductor Manufacturing 2022\uff08ISSM2022\uff09\u306b\u53c2\u52a0\u3001\u767a\u8868\u3092\u884c\u3044\u307e\u3057\u305f\u3002"},"content":{"rendered":"\n<p class=\"wp-block-paragraph\">12\u670812\u65e5\uff5e13\u65e5<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">\u53e3\u982d\u767a\u8868<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">\u4fee\u58eb\u5b66\u751f\u3000\u30bf\u30a4\u30c8\u30eb: \u201cUltra-fast Etching of Photoresist by Reactive Atmospheric-pressure Micro-Thermal Plasma Jet\u201d<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><\/p>\n","protected":false},"excerpt":{"rendered":"<p>12\u670812\u65e5\uff5e13\u65e5 \u53e3\u982d\u767a\u8868 \u4fee\u58eb\u5b66\u751f\u3000\u30bf\u30a4\u30c8\u30eb: \u201cUltra-fast Etching of Photoresist by Reactive Atmospheric-pressure Micro-Thermal P [&hellip;]<\/p>\n","protected":false},"author":2,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"sns_share_botton_hide":"","vkExUnit_sns_title":"","_vk_print_noindex":"","sitemap_hide":"","_veu_custom_css":"","veu_display_promotion_alert":"","vkexunit_cta_each_option":"","footnotes":""},"categories":[9],"tags":[],"class_list":["post-392","post","type-post","status-publish","format-standard","hentry","category-event"],"veu_head_title_object":{"title":"","add_site_title":""},"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.8 - 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